Method for making a gallium nitride light-emitting diode
US10580931B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 2, 2017 |
| Grant date | Mar 3, 2020 |
| Priority date | — |
| Expiry date | Jun 2, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/872
Abstract
A method of manufacturing a gallium nitride light-emitting diode, including the successive steps of: a) forming a planar active gallium nitride light-emitting diode stack including first and second doped gallium nitride layers of opposite conductivity types and, between the first and second gallium nitride layers, an emissive layer with one or a plurality of quantum wells; and b) growing nanowires on the surface of the first gallium nitride layer opposite to the emissive layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.