Patent · US Active

Method for making a gallium nitride light-emitting diode

US10580931B2 · kind B2 · utility

2Cited by
3References
8Claims
0Family size

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Key dates

Filing dateJun 2, 2017
Grant dateMar 3, 2020
Priority date
Expiry dateJun 2, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/872

Abstract

A method of manufacturing a gallium nitride light-emitting diode, including the successive steps of: a) forming a planar active gallium nitride light-emitting diode stack including first and second doped gallium nitride layers of opposite conductivity types and, between the first and second gallium nitride layers, an emissive layer with one or a plurality of quantum wells; and b) growing nanowires on the surface of the first gallium nitride layer opposite to the emissive layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.