Patent · US Active

Purification system of trichlorosilane and silicon crystal

US10584035B2 · kind B2 · utility

0Cited by
5References
9Claims
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Assignee

Inventors

Key dates

Filing dateFeb 8, 2018
Grant dateMar 10, 2020
Priority date
Expiry dateFeb 24, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B35/007
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A system for purifying trichlorosilane that can prevent re-contamination by the dissociation of an adduct occurring in association with the conversion of high boiling point compounds or the remaining of impurities due to an equilibrium constraint is provided. Trichlorosilane containing impurities serving as a donor or an acceptor in silicon crystals is supplied to a multistage impurity conversion step. These impurities in the trichlorosilane are converted into high boiling point compounds in the presence of a distillation aid. A plurality of impurity conversion step sections (101 to 10n) are connected in series, and any of the impurity conversion step sections comprises a reception section a for the trichlorosilane from the preceding stage section, an introduction section b for the distillation aid, a transmission section c for the trichlorosilane to the subsequent stage section, and a drain section d that discharges a remainder out of the impurity conversion step section.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.