Titanium-containing film forming compositions for vapor deposition of titanium-containing films
US10584039B2 · kind B2 · utility
2Cited by
6References
17Claims
0Family size
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Key dates
| Filing date | Nov 30, 2017 |
| Grant date | Mar 10, 2020 |
| Priority date | — |
| Expiry date | Feb 23, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R33/46
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Titanium-containing film forming compositions comprising titanium halide-containing precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Titanium-containing films on one or more substrates via vapor deposition processes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.