Method for capturing and compensating ambient effects in a measuring microscope

US10585274B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Dirk Seidel · Jena, DE
• Carola Blaesing-Bangert · Kassel, DE
• Oliver Jaeckel · Jena, DE

Key dates

• Filing date: Jul 3, 2018
• Grant date: Mar 10, 2020
• Expiry date: Jul 3, 2038

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B27/62
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

The invention relates to a method for capturing and compensating the influence of ambient conditions on an imaging scale (S) in a measuring microscope. Here, a modification of the optical properties in the measuring microscope that is caused by a change in the ambient conditions is measured by use of a reference measurement system, in particular an etalon, and, at the same time, an image of a reference structure with at least one reference length (L0) that is situated on a calibration mask is produced by use of a detector of the measuring microscope and a change (ΔL) of the reference length (L0) that is caused by the change in the ambient conditions is determined in the image of the reference structure. Subsequently, a correlation is established between the modification of the optical properties of the reference measurement system and the length change (ΔL) in the image, produced in the detector, of the reference structure of the calibration mask. This correlation can be used to carry out a computational adaptation of the size of picture elements of the detector and thus compensate the influence of ambient conditions on the imaging scale (S) of the measuring microscope.