Patent · US Active

ALD method and apparatus including a photon source

US10597778B2 · kind B2 · utility

1Cited by

3References

16Claims

0Family size

Assignee

Picosun Oy · FI

Inventor

Timo Malinen · Espoo, FI

Key dates

Filing date	Nov 25, 2015
Grant date	Mar 24, 2020
Priority date	—
Expiry date	Nov 25, 2035

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/54
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A deposition method, including providing a channel through a deposition apparatus, feeding precursor vapor into the channel, and depositing material from the precursor vapor onto a substrate on its way through the deposition apparatus by exposing the substrate to the precursor vapor and to alternating photon exposure and shade periods within the channel.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.