Timo Malinen
16Patents
3h-index
12Co-inventors
57Inventor score
Filing activity: Sep 1, 2003 → Feb 2, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9868131B2 | Atomic layer deposition with plasma source | Electricity | 397 | Active |
| US9095869B2 | Atomic layer deposition with plasma source | Electricity | 340 | Active |
| US9869020B2 | Protecting a target pump interior with an ALD coating | Mechanical Engineering; Lighting; Heating | 8 | Active |
| US9745661B2 | Method and apparatus for forming a substrate web track in an atomic layer deposition reactor | Chemistry; Metallurgy | 3 | Active |
| US10597778B2 | ALD method and apparatus including a photon source | Chemistry; Metallurgy | 1 | Active |
| US10619241B2 | ALD method and apparatus | Chemistry; Metallurgy | 1 | Active |
| US7464436B2 | Central vacuum cleaner and its central unit | Human Necessities | 1 | Expired |
| US10329662B2 | Protecting an interior of a hollow body with an ALD coating | Chemistry; Metallurgy | 1 | Active |
| US11725279B2 | Deposition or cleaning apparatus with movable structure | Electricity | 0 | Active |
| US12325915B2 | Substrate processing apparatus and method | Emerging Cross-Sectional Technologies | 0 | Active |
| US12383923B2 | Atomic layer deposition with plasma source | Electricity | 0 | Active |
| US12110588B2 | Adjustable fluid inlet assembly for a substrate processing apparatus and method | Electricity | 0 | Active |
| US11970774B2 | Method of operating a deposition or cleaning apparatus | Electricity | 0 | Active |
| US11505864B2 | Adjustable fluid inlet assembly for a substrate processing apparatus and method | Electricity | 0 | Active |
| US10494718B2 | Deposition reactor with plasma source | Electricity | 0 | Active |
| US12297535B2 | Substrate processing methods and apparatus | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.