Patent · US Active

Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus

US10599051B2 · kind B2 · utility

0Cited by

1References

19Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Stefan Hembacher · Bobingen, DE
Erik Loopstra · Eindhoven, NL
Jens Kugler · Heubach, DE
Bernhard Geuppert · Lauchheim, DE

Key dates

Filing date	Mar 28, 2019
Grant date	Mar 24, 2020
Priority date	—
Expiry date	Mar 28, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG02B27/0025
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A projection exposure apparatus for semiconductor lithography includes at least one component, and a support device with at least one support actuator which acts on at least one support location of the component so that deformations of the component are reduced. The support device includes a control unit for triggering the at least one support actuator. The control unit is configured to trigger the support actuator in the event of a dynamic acceleration acting on the component. The disclosure also relates to a method for reducing deformations, resulting from dynamic accelerations, of a projection exposure apparatus for semiconductor lithography.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.