Erik Loopstra
9Patents
3h-index
24Co-inventors
57Inventor score
Filing activity: May 2, 1996 → Jul 7, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5767948A | Lithographic device with a three-dimensionally positionable mask holder | Physics | 27 | Expired |
| US6226075A | Supporting device provided with a gas spring with a gas bearing, and lithographic device provided with such supporting devices | Physics | 21 | Expired |
| US6765712B2 | Lithographic apparatus, device manufacturing method, and device manufactured thereby | Physics | 15 | Expired |
| US10509325B2 | Position measurement of optical elements in a lithographic apparatus | Physics | 1 | Active |
| US10481500B2 | Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type | Physics | 0 | Active |
| US10908508B2 | Position measurement of optical elements in a lithographic apparatus | Physics | 0 | Active |
| US12372884B2 | Device for positioning and holding at least one optical element, measurement system | Physics | 0 | Active |
| US10599051B2 | Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus | Physics | 0 | Active |
| US12117731B2 | Method for producing a mirror of a microlithographic projection exposure apparatus | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.