Patent · US Active

Method and device for beam analysis

US10605654B2 · kind B2 · utility

1Cited by

2References

17Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Matthias Manger · Neukochen, DE
Christoph Husemann · Jena, DE
Matus Kalisky · Aalen, DE
Lars Stoppe · Jena, DE

Key dates

Filing date	Mar 12, 2018
Grant date	Mar 31, 2020
Priority date	—
Expiry date	Mar 12, 2038

Classification

Technology area (CPC G)Physics
CPC primaryG02B27/1086
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method and an apparatus for beam analysis in an optical system are disclosed, wherein a plurality of beam parameters of a beam propagating along an optical axis are ascertained. The method includes: splitting the beam into a plurality of partial beams which have a focus offset in the longitudinal direction in relation to the optical axis; recording a measurement image produced by these partial beams; carrying out a forward simulation of the beam in the optical system on the basis of estimated initial values for the beam parameters in order to obtain a simulated image; and calculating a set of values for the beam parameters on the basis of the comparison between the simulated image and the measurement image.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.