Matthias Manger
25Patents
3h-index
54Co-inventors
62Inventor score
Filing activity: Oct 8, 2004 → Jun 22, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| USD914612S1 | Electrical junction box for motor diagnosis | General | 4 | Active |
| US7408631B2 | Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask | Physics | 4 | Expired |
| US10514608B2 | Method for producing an illumination system for an EUV projection exposure system, and illumination system | Physics | 3 | Active |
| USD863226S1 | Electrical junction box for motor diagnosis | General | 3 | Active |
| US8416412B2 | Method for determination of residual errors | Physics | 3 | Active |
| US8473237B2 | Method for calibrating a specimen stage of a metrology system and metrology system comprising a specimen stage | Physics | 2 | Active |
| US11415892B2 | Method for producing a reflecting optical element of a projection exposure apparatus and reflecting optical element for a projection exposure apparatus, projection lens and projection exposure apparatus | Physics | 2 | Active |
| US7755748B2 | Device and method for range-resolved determination of scattered light, and an illumination mask | Physics | 2 | Active |
| US11054305B2 | Method and device for beam analysis | Physics | 1 | Active |
| US7760345B2 | Method and apparatus for determining at least one optical property of an imaging optical system | Physics | 1 | Active |
| US10605654B2 | Method and device for beam analysis | Physics | 1 | Active |
| US8593642B2 | Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device | Physics | 1 | Active |
| US11920977B2 | Metrology system and method for measuring an excitation laser beam in an EUV plasma source | Physics | 0 | Active |
| US8456616B2 | Optical system for microlithography | Physics | 0 | Active |
| US12276916B2 | Drive device, optical system and lithography apparatus | Physics | 0 | Active |
| US9823119B2 | System and method for analyzing a light beam guided by a beam guiding optical unit | Performing Operations; Transporting | 0 | Active |
| US9235142B2 | Projection exposure system for microlithography and method of monitoring a lateral imaging stability | Physics | 0 | Active |
| US11099400B2 | Beam propagation camera and method for light beam analysis | Physics | 0 | Active |
| US11737199B2 | Device and method for measuring the beam angle of a light beam guided by a beam guiding optical unit | Physics | 0 | Active |
| US11048172B2 | Method for producing an illumination system for an EUV projection exposure system, and illumination system | Physics | 0 | Active |
| US12130557B2 | Optical system and lithography apparatus | Physics | 0 | Active |
| US8786849B2 | Method for measuring an optical system | Physics | 0 | Active |
| US9720328B2 | Projection exposure system for microlithography and method of monitoring a lateral imaging stability | Physics | 0 | Active |
| US12372877B2 | Projection exposure apparatus for semiconductor lithography | Physics | 0 | Active |
| US11274914B2 | Measuring assembly for the frequency-based determination of the position of a component | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.