Resist composition and patterning process
US10613437B2 · kind B2 · utility
6Cited by
7References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 2018 |
| Grant date | Apr 7, 2020 |
| Priority date | — |
| Expiry date | Apr 27, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/382
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.