Jun Hatakeyama
565Patents
27h-index
110Co-inventors
93Inventor score
Filing activity: May 31, 1989 → Oct 19, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7537880B2 | Polymer, resist composition, and patterning process | Emerging Cross-Sectional Technologies | 146 | Active |
| US6312867A | Ester compounds, polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 133 | Expired |
| US6280898A | Lactone-containing compounds, polymers, resist compositions, and patterning method | Physics | 117 | Expired |
| US6448420B1 | Acid-decomposable ester compound suitable for use in resist material | Physics | 109 | Expired |
| US7569326B2 | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process | Emerging Cross-Sectional Technologies | 79 | Active |
| US7771914B2 | Resist composition and patterning process | Emerging Cross-Sectional Technologies | 73 | Active |
| US7084303B2 | Tertiary amine compounds having an ester structure and processes for preparing same | Physics | 72 | Expired |
| US6147249A | Ester compounds, polymers, resist composition and patterning process | Emerging Cross-Sectional Technologies | 62 | Expired |
| US8105748B2 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Emerging Cross-Sectional Technologies | 59 | Active |
| US7598016B2 | Resist composition and patterning process | Emerging Cross-Sectional Technologies | 59 | Active |
| US7303855B2 | Photoresist undercoat-forming material and patterning process | Emerging Cross-Sectional Technologies | 58 | Expired |
| US5972560A | High molecular weight silicone compound, chemically amplified positive resist composition and patterning method | Physics | 50 | Expired |
| US7771913B2 | Resist composition and patterning process using the same | Emerging Cross-Sectional Technologies | 48 | Active |
| US7670750B2 | Polymer, resist protective coating material, and patterning process | Physics | 46 | Active |
| US5541037A | Anti-reflective material and patterning method | Physics | 45 | Expired |
| US7455952B2 | Patterning process and resist overcoat material | Physics | 44 | Expired |
| US6048661A | Polymeric compounds, chemically amplified positive type resist materials and process for pattern formation | Emerging Cross-Sectional Technologies | 43 | Expired |
| US7358025B2 | Photoresist undercoat-forming material and patterning process | Physics | 43 | Expired |
| US6746817B2 | Resist composition and patterning process | Emerging Cross-Sectional Technologies | 38 | Expired |
| US7354693B2 | Polymer, resist protective coating material, and patterning process | Physics | 38 | Expired |
| US6749988B2 | Amine compounds, resist compositions and patterning process | Physics | 35 | Expired |
| US6673511B1 | Resist composition | Emerging Cross-Sectional Technologies | 34 | Expired |
| US8057985B2 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Emerging Cross-Sectional Technologies | 31 | Active |
| US6916593B2 | Resist composition | Emerging Cross-Sectional Technologies | 30 | Expired |
| US9250518B2 | Resist composition and patterning process | Physics | 29 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.