Patent · US Active

Method for cleaning bonding interface before bonding

US10618082B2 · kind B2 · utility

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6Claims
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Assignee

Inventors

Key dates

Filing dateFeb 26, 2018
Grant dateApr 14, 2020
Priority date
Expiry dateNov 25, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D62/8503
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The present disclosure provides a method for cleaning a bonding interface before bonding. The method includes: providing a first surface and a second surface for bonding, the first surface being a non-crystal surface and the second surface being a crystal surface; and cleaning the first surface and the second surface with ammonia respectively before bonding, wherein at least one of parameters of an ammonia concentration and a cleaning temperature for cleaning the first surface is higher than a counterpart of parameters for cleaning the second surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.