Photomasks
US10620529B2 · kind B2 · utility
0Cited by
8References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 23, 2017 |
| Grant date | Apr 14, 2020 |
| Priority date | — |
| Expiry date | Jun 21, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a photomask. The photomask comprises a substrate, a reflective layer on the substrate, and an absorption structure on the reflective layer. The absorption structure comprises absorption patterns spaced apart from each other on the reflective layer. The absorption structure may include dummy holes in at least one of the absorption patterns. The dummy holes exhaust hydrogen from the absorption structure. The photomask may include a barrier layer on the absorption structure. The barrier layer may reduce the amount of hydrogen entering the absorption structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.