Sungwon Kwon
4Patents
1h-index
10Co-inventors
34Inventor score
Filing activity: Jan 12, 2016 → Mar 13, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9952502B2 | Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same | Physics | 2 | Active |
| US10224178B2 | Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices | Electricity | 1 | Active |
| US10274820B2 | Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same | Physics | 1 | Active |
| US10620529B2 | Photomasks | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.