Incorporation of process variation contours in design rule and risk estimation aspects of design for manufacturability to increase fabrication yield
US10621295B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 10, 2018 |
| Grant date | Apr 14, 2020 |
| Priority date | — |
| Expiry date | May 5, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system and method to perform risk assessment or design rule determination for an integrated circuit involves generating two or more process variation contours based on corresponding two or more combinations of two or more factors that affect manufacturability of the integrated circuit. Each of the two or more process variation contours is associated with a probability. The method also includes generating a random number to select from among the two or more process variation contours based on a cumulative probability value associated with each of the two or more process variation contours. The cumulative probability values are determined from the probabilities. The risk assessment or the design rule determination is performed using selected ones of the two or more process variation contours. Fabrication yield is increased based on finalizing the physical layout using the process variation contours.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.