Inventor · White Plains, NY, US

Jing Sha

19Patents
4h-index
17Co-inventors
46Inventor score

Filing activity: Dec 14, 2016 → Jan 22, 2020

Most-cited inventions

PatentTitleAreaCited byStatus
US10699055B2 Generative adversarial networks for generating physical design layout patterns Emerging Cross-Sectional Technologies 7 Active
US10706200B2 Generative adversarial networks for generating physical design layout patterns of integrated multi-layers Physics 5 Active
US10621302B2 Classification and localization of hotspots in integrated physical design layouts Emerging Cross-Sectional Technologies 4 Active
US10606975B2 Coordinates-based generative adversarial networks for generating synthetic physical design layout patterns Physics 4 Active
US10592635B2 Generating synthetic layout patterns by feedforward neural network based variational autoencoders Physics 4 Active
US10539881B1 Generation of hotspot-containing physical design layout patterns Physics 4 Active
US11301748B2 Automatic feature extraction from aerial images for test pattern sampling and pattern coverage inspection for lithography Physics 4 Active
US10599807B2 Automatic generation of via patterns with coordinate-based recurrent neural network (RNN) Physics 4 Active
US10621301B2 Coordinates-based variational autoencoder for generating synthetic via layout patterns Physics 3 Active
US10831976B1 Predicting local layout effects in circuit design patterns Physics 3 Active
US10706205B2 Detecting hotspots in physical design layout patterns utilizing hotspot detection model with data augmentation Physics 3 Active
US10990747B2 Automatic generation of via patterns with coordinate-based recurrent neural network (RNN) Physics 2 Active
US10579764B2 Co-modeling post-lithography critical dimensions and post-etch critical dimensions with multi-task neural networks Physics 2 Active
US11045404B2 Thickening cleansing compositions and applications and methods of preparation thereof Chemistry; Metallurgy 1 Active
US10621295B2 Incorporation of process variation contours in design rule and risk estimation aspects of design for manufacturability to increase fabrication yield Emerging Cross-Sectional Technologies 1 Active
US11189566B2 Tight pitch via structures enabled by orthogonal and non-orthogonal merged vias Electricity 1 Active
US10657420B2 Modeling post-lithography stochastic critical dimension variation with multi-task neural networks Physics 0 Active
US10678971B2 Space exploration with Bayesian inference Emerging Cross-Sectional Technologies 0 Active
US10768532B2 Co-optimization of lithographic and etching processes with complementary post exposure bake by laser annealing Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.