Apparatus for evacuating a corrosive effluent gas stream from a processing chamber
US10625205B2 · kind B2 · utility
0Cited by
6References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 15, 2016 |
| Grant date | Apr 21, 2020 |
| Priority date | — |
| Expiry date | Jun 15, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Dry pumps are used to pump a variety of gas mixtures from the semiconductor industry. The present invention provides a liquid ring pump located between the dry pump and an abatement device to remove soluble corrosive materials prior to the exhaust gases entry to the abatement device, the work fluid exhausted from the liquid ring pump being separated from the gas prior to entry to the abatement device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.