Patent · US Active

Deposition device structure

US10626499B2 · kind B2 · utility

1Cited by
0References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 5, 2017
Grant dateApr 21, 2020
Priority date
Expiry dateJun 24, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/46
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A deposition device structure is provided. The deposition device structure includes a heater in a chamber. The deposition device structure also includes a shower head over the heater. The shower head includes holes extending from a top surface of the shower head to a bottom surface of the shower head. The bottom surface of the shower head faces the heater. The bottom surface of the shower head has a first section and a second section. The second section of the bottom surface is rougher than the first section of the bottom surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.