Method and system for automatically extracting layout design patterns for custom layout design reuse through interactive recommendations
US10628546B1 · kind B1 · utility
16Cited by
8References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 29, 2018 |
| Grant date | Apr 21, 2020 |
| Priority date | — |
| Expiry date | Jun 29, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06N7/01
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Disclosed are method(s), system(s), and article(s) of manufacture for implementing layouts for an electronic design using machine learning, where users re-use patterns of layouts that have been previously implemented, and those previous patterns are applied to create recommendations in new situations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.