Patent · US Active

Method and system for automatically extracting layout design patterns for custom layout design reuse through interactive recommendations

US10628546B1 · kind B1 · utility

16Cited by
8References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 29, 2018
Grant dateApr 21, 2020
Priority date
Expiry dateJun 29, 2038

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06N7/01
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

Disclosed are method(s), system(s), and article(s) of manufacture for implementing layouts for an electronic design using machine learning, where users re-use patterns of layouts that have been previously implemented, and those previous patterns are applied to create recommendations in new situations.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.