Apparatus for transportation of a substrate carrier in a vacuum chamber, system for vacuum processing of a substrate, and method for transportation of a substrate carrier in a vacuum chamber

US10636687B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Simon Lau · Alzenau, DE
• Wolfgang BUSCHBECK · Hanau, DE

Key dates

• Filing date: Jan 18, 2016
• Grant date: Apr 28, 2020
• Expiry date: Jan 18, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6776
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An apparatus for transportation of a substrate carrier in a vacuum chamber is provided. The apparatus includes a first track providing a first transportation path for the substrate carrier, and a transfer device configured for contactlessly moving the substrate carrier from a first position on the first track to one or more second positions away from the first track. The one or more second positions include at least one of a position on a second track and a process position for processing of a substrate. The transfer device includes at least one first magnet device configured to provide a magnetic force acting on the substrate carrier to contactlessly move the substrate carrier from the first position to the one or more second positions.