Liquid processing apparatus, liquid processing method, and storage medium
US10643872B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2017 |
| Grant date | May 5, 2020 |
| Priority date | — |
| Expiry date | Oct 6, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/162
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed is a liquid processing apparatus including: a plurality of substrate placement regions; a nozzle that supplies a processing liquid to a substrate from each processing position; a nozzle placement region provided behind a row of the substrate placement regions; an arm that detachably holds the nozzle at one end side; a driving unit that horizontally pivots the arm around a pivot axis; and a controller that outputs a control signal to convey the nozzle from the nozzle placement region to a standby position corresponding to a processing position of a conveyance destination, cause the nozzle to stand by at the standby position, and then, convey the nozzle to the processing position. The standby position is outside the substrate placement regions and is located between the processing position and the nozzle placement region when viewed in a front-and-rear direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.