Patent · US Active

Ceramic ring with a ladder structure

US10643882B2 · kind B2 · utility

0Cited by
2References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 18, 2017
Grant dateMay 5, 2020
Priority date
Expiry dateAug 18, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68785
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A ceramic ring for supporting a wafer, comprising: a body; and an annular recess provided in the center of the body, the annular recess having a bottom surface and a buffer portion extending upwards from the bottom surface to the surface of the body. The ceramic ring can ensure reliability in positioning the wafer, and can prevent the edge side of the wafer from generating particles by contacting the ceramic ring.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.