Optical isolation module
US10645789B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 23, 2017 |
| Grant date | May 5, 2020 |
| Priority date | — |
| Expiry date | Oct 23, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.