Imaging optical unit and projection exposure unit including same
US10656400B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 10, 2017 |
| Grant date | May 19, 2020 |
| Priority date | — |
| Expiry date | Apr 28, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70233
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An imaging optical unit for projection lithography has a plurality of mirrors for guiding imaging light from an object field into an image field. The object field is spanned by two object field coordinates, with a normal coordinate being perpendicular thereto. Imaging light propagates in a first imaging light plane through at least one first plane intermediate image of the imaging optical unit. In a second imaging light plane, the imaging light propagates through at least one second plane intermediate image of the imaging optical unit. The number of first plane intermediate images and the number of second plane intermediate images differ from one another. An imaging optical unit with reduced production costs emerges.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.