Markus Schwab
31Patents
5h-index
39Co-inventors
69Inventor score
Filing activity: Nov 14, 2003 → Jun 28, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7408616B2 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Physics | 76 | Expired |
| US7847921B2 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Physics | 47 | Active |
| US10545323B2 | Projection optical unit for EUV projection lithography | Physics | 11 | Active |
| US10527832B2 | Imaging optical unit and projection exposure apparatus including same | Physics | 11 | Active |
| US7423871B2 | Electric device with improved cooling and casing therefor | Electricity | 6 | Expired |
| US9046786B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 4 | Active |
| US8264668B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 4 | Active |
| US9477157B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9213244B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9678438B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US8928859B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9759550B2 | Projection exposure apparatus for microlithography comprising an optical distance measurement system | Electricity | 1 | Active |
| US10114293B2 | Illumination system and projection objective of a mask inspection apparatus | Physics | 1 | Active |
| US10656400B2 | Imaging optical unit and projection exposure unit including same | Physics | 1 | Active |
| US7508489B2 | Method of manufacturing a miniaturized device | Physics | 1 | Active |
| US10012911B2 | Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator | Physics | 1 | Active |
| US9170499B2 | Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element | Physics | 1 | Active |
| US7808615B2 | Projection exposure apparatus and method for operating the same | Physics | 1 | Active |
| US10146033B2 | Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unit | Physics | 1 | Active |
| US10162267B2 | Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations | Physics | 0 | Active |
| US8537335B2 | Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system | Physics | 0 | Active |
| US11226481B2 | Methods and apparatuses for designing optical systems using machine learning with delano diagrams | Physics | 0 | Active |
| US9714822B2 | Projection exposure apparatus for microlithography comprising an optical distance measurement system | General | 0 | Revoked |
| US9535331B2 | Optical system for a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US10288894B2 | Optical component for use in a radiation source module of a projection exposure system | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.