Measurement apparatus, exposure apparatus, and method of manufacturing article
US10656541B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 25, 2019 |
| Grant date | May 19, 2020 |
| Priority date | — |
| Expiry date | Apr 25, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2223/5446
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a measurement apparatus including a first filter unit including a plurality of first filters, and each configured to allow light having a different wavelength band to pass, a second filter unit including a plurality of second filters, and each configured to reduce light intensity of light and allow the light to pass, an obtaining unit configured to obtain data representing a transmittance of each of the plurality of second filters for a wavelength band of light having passed through each of the plurality of first filters, and a selection unit configured to select, based on the data obtained by the obtaining unit, from the plurality of second filters, one second filter arranged on an optical path together with one first filter among the plurality of first filters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.