Displacement directed tessellation
US10657710B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Feb 23, 2018 |
| Grant date | May 19, 2020 |
| Priority date | — |
| Expiry date | Feb 23, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2210/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Systems, methods, and devices are disclosed for rendering computer graphics. In various embodiments, a displacement map is created for a plurality of surfaces and a tessellation process is initiated. It is determined that the tessellation density of a first set of surfaces and a second set of surfaces should be modified based on the displacement map. Based on the displacement map, a tessellation factor scale for each surface of the first set of surfaces is increased and a tessellation factor scale for each surface of the second set of surfaces is decreased, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.