Substrate cleaning apparatus and substrate processing facility having the same
US10665477B2 · kind B2 · utility
1Cited by
6References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 28, 2016 |
| Grant date | May 26, 2020 |
| Priority date | — |
| Expiry date | Jun 3, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67034
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate cleaning apparatus includes a porous suction part having a polygonal pillar shape with a plurality of cleaning surfaces, a transfer unit to transfer a substrate with a plurality of semiconductor devices toward the porous suction part, and to contact the semiconductor devices with one of the plurality of cleaning surfaces, and a rotation driving part to rotate the porous suction part.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.