Semiconductor structure including a suspended membrane containing a central segment of structured thickness
US10666019B2 · kind B2 · utility
1Cited by
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13Claims
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Assignee
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Key dates
| Filing date | Aug 2, 2018 |
| Grant date | May 26, 2020 |
| Priority date | — |
| Expiry date | Aug 9, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A semiconductor structure including a semiconductor layer made of a crystalline semiconductor compound, a portion of the semiconductor layer which forms a suspended membrane above a carrier layer, the suspended membrane being formed from a tensilely stressed central segment and a plurality of lateral segments forming tensioning arms. The central segment includes at least one zone of thinned thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.