Method of cleaning process chamber
US10668511B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Mar 20, 2018 |
| Grant date | Jun 2, 2020 |
| Priority date | — |
| Expiry date | Apr 10, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4404
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of cleaning a process chamber includes following steps. A plurality of process films and a plurality of non-process films are alternately formed on an interior surface of the process chamber. A cleaning operation is performed to remove the plurality of process films and the plurality of non-process films from the interior surface of the process chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.