Method for preparing film micro-optical structure based on photolithography and chemomechanical polishing

US10670806B2 · kind B2 · utility

Assignee

• Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences · CN

Inventors

• Ya Cheng · Shanghai, CN
• Rongbo Wu · Shanghai, CN
• Jintian Lin · Shanghai, CN
• Jianhao Zhang · New Taipei, TW
• Min Wang · Santa Clara, US

Key dates

• Filing date: May 6, 2019
• Grant date: Jun 2, 2020
• Expiry date: May 6, 2039

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B2006/12197
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Method for preparing micro-optical structure on a film based on chemical mechanical polishing etching, combining photolithography technology with chemical mechanical polishing technology to make preparation and large-scale integration of large-size high-quality micro optical devices on-chip possible. The method comprises coating metal on film surface, selectively removing the metal film by photolithography (such as femtosecond laser selective ablation, ultraviolet photolithography, electron beam etching, ion beam etching, and reactive ion etching), chemical mechanical polishing, chemical corrosion or over polishing and other steps. Micro-optical devices on-chip prepared by the method have extremely high surface finish and extremely low optical loss. The method is applicable to preparing high-quality micro-optical structures (including but not limited to microdisc cavities, microring cavities, optical waveguides and coupled devices thereof) on various films on-chip (including but not limited to lithium niobate single crystal films, quartz films, silicon films, silicon dioxide films, diamond thin films, etc.).