Reverse pattern formation composition, reverse pattern formation method, and device formation method
US10670969B2 · kind B2 · utility
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Key dates
| Filing date | Jul 3, 2017 |
| Grant date | Jun 2, 2020 |
| Priority date | — |
| Expiry date | Jul 3, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/16
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
[Problem] To provide a composition, which is a reverse pattern formation composition comprising an aqueous solvent having little influence on a resist pattern, and which is excellent in flatness and filling properties after coating and has excellent etching resistance. Furthermore, a method for forming a pattern using the same is provided. [Means for Solution] A reverse pattern formation composition comprising a polysiloxane compound comprising a repeating unit having a nitrogen-containing group and a solvent comprising water, and a method for forming a fine pattern using the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.