Projection system modelling method
US10678143B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 15, 2017 |
| Grant date | Jun 9, 2020 |
| Priority date | — |
| Expiry date | May 15, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection system model is configured to predict optical aberrations of a projection system based upon a set of projection system characteristics and to determine and output a set of optical element adjustments based upon a merit function. The merit function comprises a set of parameters and corresponding weights. The method comprises receiving an initial merit function and executing an optimization algorithm to determine a second merit function. The optimization algorithm scores different merit functions based upon projection system characteristics of a projection system adjusted according to the output of the projection system model using a merit function having that set of parameters and weights.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.