Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same
US10679880B2 · kind B2 · utility
5Cited by
193References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2017 |
| Grant date | Jun 9, 2020 |
| Priority date | — |
| Expiry date | Feb 12, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, a method of achieving improved transient response in apparatuses for controlling gas flow is disclosed. Specifically, by providing a command to the apparatus to deliver a predetermined mass flow rate at a future turn on time, the apparatus is able to pre-pressurize a P1 volume so that the response time of the apparatus is no longer dependent on the speed of the apparatus's control valves and the limitations of the control loop.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.