High voltage tolerant LDMOS
US10680098B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 22, 2016 |
| Grant date | Jun 9, 2020 |
| Priority date | — |
| Expiry date | Oct 9, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/393
Abstract
An LDMOS device in FinFET technology is disclosed. In one aspect, the device includes a first region substantially surrounded by a second region of different polarity. The device further includes a first fin in the first region, extending into the second region, the first fin including a doped source region connected with a first local interconnect. The device further includes a second fin in the second region, including a doped drain region connected with a second local interconnect. The device further includes a third fin parallel with the first and second fins including a doped drain region connected with the second local interconnect. The device further includes a gate over the first fin at the border between the first and second regions. A first current path runs over the first and second fins. A second current path runs over and perpendicular to the first fin towards the third fin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.