Patent · US Active

High voltage tolerant LDMOS

US10680098B2 · kind B2 · utility

0Cited by
1References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 22, 2016
Grant dateJun 9, 2020
Priority date
Expiry dateOct 9, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D62/393

Abstract

An LDMOS device in FinFET technology is disclosed. In one aspect, the device includes a first region substantially surrounded by a second region of different polarity. The device further includes a first fin in the first region, extending into the second region, the first fin including a doped source region connected with a first local interconnect. The device further includes a second fin in the second region, including a doped drain region connected with a second local interconnect. The device further includes a third fin parallel with the first and second fins including a doped drain region connected with the second local interconnect. The device further includes a gate over the first fin at the border between the first and second regions. A first current path runs over the first and second fins. A second current path runs over and perpendicular to the first fin towards the third fin.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.