Method of manufacturing shadow mask using hybrid processing and shadow mask manufactured thereby
US10680177B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 4, 2016 |
| Grant date | Jun 9, 2020 |
| Priority date | — |
| Expiry date | Jan 29, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/162
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The present invention discloses a method of manufacturing a shadow mask, wherein hybrid processing is used to form a mask pattern on the shadow mask, the method includes: forming a laser-processed pattern by irradiating a laser beam from above a base; and forming a wet-etched pattern that continues from the laser-processing pattern, by performing wet etching from above the base or from below the base on which the laser-processed pattern is formed. The present invention uses hybrid processing including wet etching and laser processing for manufacturing a shadow mask. The method has an effect on solving the productivity degradation of the conventional laser processing and provides a shadow mask with high quality using wet etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.