Method and apparatus for X-ray scatterometry
US10684238B2 · kind B2 · utility
1Cited by
38References
5Claims
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Key dates
| Filing date | Jan 5, 2017 |
| Grant date | Jun 16, 2020 |
| Priority date | — |
| Expiry date | Oct 13, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.