Pellicle for photomask, reticle including the same, and exposure apparatus for lithography
US10684560B2 · kind B2 · utility
4Cited by
4References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2018 |
| Grant date | Jun 16, 2020 |
| Priority date | — |
| Expiry date | Mar 12, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70958
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pellicle for a photomask, a reticle including the same, and an exposure apparatus for lithography are provided. The pellicle may include a pellicle membrane and a passivation member. The pellicle membrane may include a carbon-based material having defects. The passivation member may cover the defects of the carbon-based material. The passivation member may include an inorganic material. The passivation member may be disposed on one or two surfaces of the pellicle membrane. The pellicle for the photomask may be applied to extreme ultraviolet (EUV) lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.