Titanium-containing film forming compositions for vapor deposition of titanium-containing films
US10689405B2 · kind B2 · utility
1Cited by
3References
13Claims
0Family size
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Key dates
| Filing date | May 1, 2018 |
| Grant date | Jun 23, 2020 |
| Priority date | — |
| Expiry date | May 19, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45553
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Titanium-containing film forming compositions comprising titanium halide-containing precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Titanium-containing films on one or more substrates via vapor deposition processes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.