Deposition platform for flexible substrates and method of operation thereof

US10689760B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Jose Manuel DIEGUEZ-CAMPO · Hanau, DE
• Heike Landgraf · Bruchköbel, DE
• Tobias Stolley · Oberursel, DE
• Stefan Hein · Berlin, DE
• Florian RIES · Stuttgart, DE
• Morrison NEIL · Heitersheim, DE

Key dates

• Filing date: Nov 14, 2016
• Grant date: Jun 23, 2020
• Expiry date: Dec 1, 2038

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/509
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An apparatus for processing a flexible substrate is provided including a vacuum chamber having a first chamber portion, second chamber portion and third chamber portion. The apparatus further includes an unwinding shaft supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion, a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below a rotational axis of the coating drum.