Cleaning composition

US10696932B2 · kind B2 · utility

Assignee

• Fujifilm Electronic Materials U.S.A., Inc. · US

Inventors

• Raj Sakamuri · Sharon, US
• Ognian N. Dimov · East Greenwich, US
• Ahmad A. Naiini · East Greenwich, US
• Sanjay Malik · Attleboro, US
• Binod B. De · Attleboro, US
• William A. Reinerth · Westminster, US

Key dates

• Filing date: Jul 28, 2016
• Grant date: Jun 30, 2020
• Expiry date: Oct 18, 2036

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/2053
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

This disclosure relates to a composition (e.g., a cleaning and/or stripping composition) containing (a) 0.5-25 percent by weight an alkaline compound; (b) 1-25 percent by weight an alcohol amine compound; (c) 0.1-20 percent by weight a hydroxylammonium compound; (d) 5-95 percent by weight an organic solvent; (e) 0.1-5 percent by weight a corrosion inhibitor compound; and (f) 2-25 percent by weight water.