Patent · US Active

Collimator for use in a physical vapor deposition chamber

US10697057B2 · kind B2 · utility

0Cited by

3References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Goichi Yoshidome · Emeryville, US
Keith A. Miller · Schererville, US
Hamid Tavassoli · Cupertino, US
Andrew John Tomko · Santa Clara, US

Key dates

Filing date	Nov 16, 2017
Grant date	Jun 30, 2020
Priority date	—
Expiry date	Mar 26, 2038

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/046
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Embodiments of collimators and process chambers incorporating same are provided herein. In some embodiments, a collimator for use in a substrate processing chamber includes a ring; an adapter surrounding the ring and having an inner annular wall; and a plurality of spokes extending from the inner annular wall and intersecting at a central axis of the collimator.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.