Generative adversarial networks for generating physical design layout patterns
US10699055B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2018 |
| Grant date | Jun 30, 2020 |
| Priority date | — |
| Expiry date | Jun 12, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for generating physical design layout patterns includes selecting as training data a set of physical design layout patterns of features in a given layer of a given patterned structure and converting the physical design layout patterns into two-dimensional (2D) arrays comprising entries for different locations in the given layer of the given patterned structure with values representing presence of the features at the different locations. The method also includes training, utilizing the 2D arrays, a generative adversarial network (GAN) comprising a discriminator neural network and a generator neural network. The method further includes generating one or more synthetic 2D arrays utilizing the trained generator neural network of the GAN, a given synthetic 2D array comprising entries for different locations in the given layer of a new physical design layout pattern with values representing presence of the features at the different locations of the new physical design layout pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.