Patent · US Active

Vacuum condition controlling apparatus, system and method for specimen observation

US10699874B2 · kind B2 · utility

0Cited by
9References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 2, 2017
Grant dateJun 30, 2020
Priority date
Expiry dateMar 2, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/2605
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A vacuum condition controlling apparatus, the top of which is connected with an electron beam generating instrument. The apparatus is rotationally symmetric, comprises the following parts deployed outward from the central axis: the central channel, the first pumping channel, the gas supplying chamber and the at least one pumping chamber. A pressure limiting aperture is deployed near the outlet of the central channel, for keeping the pressure difference between the central channel and the outside environment, and allow the electron beam to go through the central channel; the first pumping channel is connected to the central channel to pump the central channel; the top of the gas supplying chamber is connected to the gas supplying channel to supply gas to the area between the specimen and the apparatus; the top of the second pumping channel is connected to the second pumping channel, to pump the area.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.