Patent · US Active

Sample stage/holder for improved thermal and gas flow control at elevated growth temperatures

US10704160B2 · kind B2 · utility

4Cited by
21References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 10, 2017
Grant dateJul 7, 2020
Priority date
Expiry dateFeb 17, 2038

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/1016
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Apparatuses and methods are provided for manufacturing diamond electronic devices. The apparatus includes a base comprising a water-block and a cover that at least partially covers the water-block. The apparatus includes a sample stage disposed on the base. The apparatus further includes a sample holder disposed on the sample stage and configured to accept a diamond substrate. The apparatus includes controlled thermal interfaces between water-block, sample stage, sample holder and diamond substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.