Sample stage/holder for improved thermal and gas flow control at elevated growth temperatures
US10704160B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 10, 2017 |
| Grant date | Jul 7, 2020 |
| Priority date | — |
| Expiry date | Feb 17, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1016
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatuses and methods are provided for manufacturing diamond electronic devices. The apparatus includes a base comprising a water-block and a cover that at least partially covers the water-block. The apparatus includes a sample stage disposed on the base. The apparatus further includes a sample holder disposed on the sample stage and configured to accept a diamond substrate. The apparatus includes controlled thermal interfaces between water-block, sample stage, sample holder and diamond substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.