Mask bias approximation
US10705420B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | May 15, 2018 |
| Grant date | Jul 7, 2020 |
| Priority date | — |
| Expiry date | May 15, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Directly biasing a mask image is disclosed. A method includes generating a mask image for the mask, biasing the mask image to obtain a biased mask image, and simulating the biased mask image to obtain a wafer image to be compared to the design pattern. Biasing the mask image includes updating at least one pixel of the mask image using an interpolation of neighboring pixels of the at least one pixel, the interpolation being dependent on a predetermined value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.