Imprint method
US10705422B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 25, 2017 |
| Grant date | Jul 7, 2020 |
| Priority date | — |
| Expiry date | May 3, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29K2101/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.