Generative adversarial networks for generating physical design layout patterns of integrated multi-layers
US10706200B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 5, 2018 |
| Grant date | Jul 7, 2020 |
| Priority date | — |
| Expiry date | Jul 29, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/398
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for generating physical design layout patterns includes selecting as training data one or more physical design layout patterns of integrated multi-layers for features in at least two layers of a given patterned structure. The method also includes converting the physical design layout patterns into three-dimensional arrays, a given three-dimensional array comprising a set of two-dimensional arrays each representing features of one layer of the layers in a given one of the physical design layout patterns. The method further includes training, utilizing the three-dimensional arrays, a generative adversarial network (GAN) comprising a discriminator neural network and a generator neural network. The method further includes generating synthetic three-dimensional arrays utilizing the generator neural network of the trained GAN, a given synthetic three-dimensional array comprising a set of two-dimensional arrays each representing features for a new layer of a new physical design layout pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.