Imprint lithography apparatus and method
US10712678B2 · kind B2 · utility
0Cited by
31References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 17, 2016 |
| Grant date | Jul 14, 2020 |
| Priority date | — |
| Expiry date | Sep 11, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2059/023
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.